Global Sub-100nm Lithography Market Analysis and Strategic Issues Report 2015

This report examines and projects the technologies involved, their likely developments, what problems and choices are facing users, and where the opportunities and pitfalls are. The worldwide lithography markets are analyzed and projected by type (EUV, DUV, and optical), and market shares by vendor for each type.

Key Topics Covered:

Chapter 1 Introduction

1.1 The Need For This Report

Chapter 2 Executive Summary

2.1 Summary of Major Issues

2.2 Summary of Market Opportunities

Chapter 3 Lithography Issues And Trends

3.1 Optical Systems

3.1.1 Introduction

3.1.2 Step-and-Repeat Aligners

3.1.3 Deep Ultraviolet (DUV)

3.2 EUV

3.5 Nano-Imprint Lithography

3.4 X-Ray Lithography

3.3 Electron Beam Lithography

3.4 Ion Beam Lithography

Chapter 4 User - Supplier Strategies

4.1 Determining Lithography Needs

4.2 Benchmarking a Vendor

4.2.1 Pricing

4.2.2 Vendor Commitment and Attitudes

4.2.3 Vendor Capabilities

4.2.4 System Capabilities

4.2.5 Vendor Feedback During Equipment Evaluation

4.2.6 Vendor Feedback During Device Production

4.3 Competitive Environment

4.4 Equipment For Class 1 Cleanrooms

4.5 Equipment For the Factory of the Future

4.6 Opportunities

Chapter 5 Market Forecast

5.1 Driving Forces

5.1.1 Technical Trends

5.1.2 Economic Trends

5.1.3 Optical Limitations

5.2 Market Forecast Assumptions

5.3 Market Forecast

For more information visit

http://www.researchandmarkets.com/research/22zz9j/sub100nm

Media Contact:

Laura Wood, +353-1-481-1716, [email protected]